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在镀金溶液中添加了锑、钴、铟3种离子，研究了电流密度、离子配比量对其沉积层的硬度及耐磨性的影响，讨论了各种离子对沉积层性能的作用机理．
The antimony, cobalt and indium ions were added to the gold plating solution. The effects of current density and ion ratio on the hardness and wear resistance of the deposited layer were studied. The mechanism of various ions on the performance of the deposited layer was discussed.