使用C2 H2 和CHF3 的混合气体 ,在改变微波功率的条件下 ,利用微波电子回旋共振等离子体增强化学气相沉积方法制备了氟化非晶碳薄膜 (a C∶F) .薄膜的傅里叶变换红外光谱分析结果表明 :薄膜中的CC与C—F键含量的比值随功率的增加而相应地增大 ;借助于紫外可见光谱分析发现 ,薄膜的光学带隙随功率的增大而减小 .由此推断微波输入功率的提高有助于增强薄膜的交联结构 .a C∶F薄膜的交流电导与x射线光电子能谱进一步证实了这种增强效应 The fluorinated amorphous carbon film (a C: F) was prepared by using microwave electron cyclotron resonance plasma enhanced chemical vapor deposition (CVD) with mixed gas of C2 H2 and CHF3 under the condition of changing the microwave power. The results of IR spectroscopy showed that the ratio of CC to C-F bond increased with the increase of power. The UV-Vis spectra showed that the optical band gap decreased with the increase of power. It is concluded that the increase of input power of microwave helps to enhance the cross-linked structure of the films.a AC conductance and x-ray photoelectron spectroscopy of C: F films further confirm this enhancement effect