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用外部电极电容耦合式辉光放电装置研究了六甲基环三硅氧烷在NH_3或N_2中的等离子体聚合。用红外光谱,X线光电子能谱研究了聚合物结构,并测定了聚合物的热稳定性及对水的接触角,计算了聚合物的表面能。结果表明,NH_3和N_2都参加了聚合反应,N在聚合物中的存在形式主要为C=NH,随NH_3在反应体系中浓度的增加,聚合物中的N含量也增加,在NH_3中制备的聚合膜有很好的疏水性。
The plasma polymerization of hexamethylcyclotrisiloxane in NH_3 or N_2 was studied with an external electrode capacitively coupled glow discharge device. The structure of the polymer was studied by infrared spectroscopy and X-ray photoelectron spectroscopy. The thermal stability and contact angle of the polymer were also measured. The surface energy of the polymer was calculated. The results show that both NH 3 and N 2 participate in the polymerization. The main form of N exists in the polymer is C = NH. The content of N in the polymer increases with the concentration of NH 3 in the reaction system. Polymeric membranes have good hydrophobicity.