论文部分内容阅读
第2期光CVD技术专辑用于半导体工艺中的光CVD技术Hg敏化光CVD-SiO_2薄膜的研究硅衬底上光CVD-SiO_2薄膜附着力和应力的研究Hg敏化光CVD-SiO_2薄膜中Hg含量的x-射线荧光分析PVD-270-1型光化学气相沉淀积设备的研制
Issue 2 Photoperiodic CVD technology for photo CVD technology in semiconductor process Hg sensitized photo-CVD-SiO 2 film on the silicon substrate on the adhesion of light and CVD-SiO 2 film adhesion and stress Hg sensitized light CVD-SiO 2 film X-ray Fluorescence Analysis of Hg Content Development of PVD-270-1 Photochemical Vapor Deposition Device