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美国GCA公司试制了直接描画用的电子束曝光装置,计划在1982年末开始出售。该装置为可变矩形束方式,最小曝光图形为0.5μm,曝光速率为3×10~6个图形/秒,每小时可曝光4英寸片子7～10片。使用Ba系电子枪,电流密度为20A/cm~2,为电磁/静电偏转。能曝光6.99×6.99mm的面积(使用以7.5cm/s移动的x-y工作台,可处理5英寸片子)。将6.99mm见方的面积分成64×64个小区域,在小区域中进行矢量扫描。束的尺寸可每隔
The United States GCA trial of a direct draw with the electron beam exposure device, is scheduled to begin selling in late 1982. The device is a variable rectangular beam method, the minimum exposure pattern is 0.5μm, the exposure rate of 3 × 10 ~ 6 graphics / sec, exposure of 4-inch film per hour 7 to 10 pieces. The use of Ba-based electron gun, the current density of 20A / cm ~ 2, electromagnetic / electrostatic deflection. The 6.99 × 6.99mm area can be exposed (using an x-y table moving at 7.5cm / s for 5-inch wafers). The area of 6.99 mm square is divided into 64 × 64 small areas for vector scanning in a small area. The size of the beam can be every other time