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采用分子动力学方法模拟了不同能量的CH粒子与聚变材料Be的相互作用。根据托卡马克中的环境,入射粒子CH的模拟入射能量分别设定为低能量(1,5,10,25 eV)和高能量(50,100,150,200 eV),其中碳的沉积率随能量的增大逐渐增加,而氢的沉积率恰好相反。当CH粒子的入射能量为低能量时,Be样品表面形成一层碳氢膜;且其膜厚度越来越薄,并且形成一个厚度逐渐增加中间层;当入射能量为高能量时,样品中的Be原子溅射越来越大,入射粒子在样品中的入射深度越来越深,对样品的破坏越来越大,且会在样品中形成一个C反应层。
Molecular dynamics simulations were used to simulate the interaction between CH particles of different energies and the fusion material Be. According to the environment in Tokamak, the simulated incident energies of incident particles CH are set to low energy (1,5,10,25 eV) and high energy (50,100,150,200 eV), respectively. The deposition rate of carbon gradually increases with the increase of energy Increase, while hydrogen deposition rate is the opposite. When the incident energy of CH particles is low energy, the surface of Be sample forms a layer of hydrocarbon film; and its film thickness is thinner and thinner, and an intermediate layer with a gradually increasing thickness is formed; when the incident energy is high energy, Be atomic sputtering more and more, incident particles deeper and deeper in the sample, the destruction of the sample is more and more, and will form a C reaction layer in the sample.