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从理论上详细计算了在全内反射的条件下 ,两束入射光产生的隐失干涉场 (即隐失驻波 )的强度分布 ,并分析了其不同于传统传播波干涉场的特点。同时使用数值模拟证明了利用隐失干涉场 ,即隐失驻波的激发方式 ,可以提高系统的分辨力 ,在横向实现超经典分辨的荧光成像。具体的分析表明 ,两束光以相等的角度入射 ,同时振幅相等 ,偏振态相同 ,所形成干涉条纹的反衬度最高 ,此时成像系统的有效点扩展函数最优化 ;入射介质 1的折射率越大 ,隐失干涉场的空间周期越短 (空间频率越高 ) ,其对应的调制点扩展函数中心瓣的半峰全宽越小 ,可能分辨更小的物体 ,但同时旁瓣的强度也增强 ,最终成像的分辨力受两者的共同制约
The intensity distribution of the evanescent interference field (ie, hidden standing wave) generated by two incident beams under total internal reflection conditions is calculated in detail in theory and the characteristics of the interference field different from the traditional propagating wave interference field are analyzed. At the same time, numerical simulation is used to prove that using the evanescent interfering field, that is, evanescent standing wave excitation mode, can improve the resolution of the system and achieve ultra-classical resolution of fluorescence imaging in the horizontal direction. The detailed analysis shows that the two beams of light are incident at equal angles and have the same amplitude and the same polarization state, and the contrast fringes formed by the interference fringes have the highest contrast. At this time, the effective point spread function of the imaging system is optimized. The refractive index of the incident medium 1 The shorter the spatial period of the large and the missing interfering fields (the higher the spatial frequency), the smaller the full width at half maximum of the central lobe of the corresponding modulation point expansion function, and the smaller the size of the sidelobe. , The resolution of the final imaging by both common constraints