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通过分段电积、SO2还原、蒸发结晶使铜电解液中的铜砷得到分离与回收。当电流密度为200A/m2、电解液温度为55°C、电解液循环速率为10mL/min、终点铜浓度高于25.88g/L时,电积得到纯阴极铜。调节电流密度为100A/m2、电解液温度为65°C、铜离子浓度从24.69g/L降至0.42g/L时,砷的去除率为18.25%。通入SO2将脱铜电解液中的As(V)充分还原为As(Ⅲ)后,蒸发浓缩还原后液,冷却结晶得到As2O3晶体,砷的回收率为59.76%。阴极极化曲线表明,铜离子浓度和As(V)均影响铜还原的极限电流密度。
By segmented electrodeposition, SO2 reduction, evaporation and crystallization of copper and arsenic in the copper electrolyte was separated and recovered. When the current density of 200A / m2, the electrolyte temperature is 55 ° C, the electrolyte circulation rate of 10mL / min, the end copper concentration higher than 25.88g / L, the electrodeposited pure copper cathode. The arsenic removal rate was 18.25% when the current density was adjusted to 100 A / m2, the electrolyte temperature was 65 ° C, and the copper ion concentration was reduced from 24.69 g / L to 0.42 g / L. Passing SO2, the As (V) in the copper removal electrolyte is fully reduced to As (III), and the reduced liquid is evaporated and concentrated to obtain As2O3 crystals. The recovery rate of arsenic is 59.76%. Cathodic polarization curve shows that the copper ion concentration and As (V) all affect the limiting current density of copper reduction.