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研制了一台4MV静电加速器用高频离子源;测试并分析了振荡器板压、离子源气压和引出电压对离子束品质的影响;在575V板压、7.7×10-4Pa气压、1.6kV引出电压和21kV聚焦电压的状态下,得到了束流为169μA、质子比为88%的稳定离子束.
A 4MV electrostatic accelerator with a high-frequency ion source was developed. The influences of oscillator plate pressure, ion source pressure and extraction voltage on the ion beam quality were tested and analyzed. At a plate pressure of 575V, a pressure of 7.7 × 10-4Pa and a voltage of 1.6kV Voltage and 21kV focus voltage state, the beam was 169μA, proton ratio 88% stable ion beam.