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运用微分理论对刻线密度为1200 lp/mm的紫外刻划光栅母版及其二代复制版的衍射特性做了模拟,指出了二者之间存在的差异,并与测试结果做了对照。数值模拟表明,紫外刻划光栅二代复制版的衍射特性与其母版略有不同,原因是光栅槽形发生了改变,分别给出了采用多项式拟合槽形函数和傅里叶级数拟合槽形函数的方法。此理论分析方法为澄清光栅复制工艺中的争议完善翻版技术以及寻找提高紫外光栅衍射效率的途径提供了很好的理论参考依据。
The differential theory was used to simulate the diffraction characteristics of the UV engraved master and its second-generation replica with an engraved density of 1200 lp / mm. The differences between the two were pointed out and compared with the test results. The numerical simulation shows that the diffraction characteristics of the second-generation replica of UV scoring grating are slightly different from those of the master. The reason is that the groove shape of the grating has been changed. The polynomial fitting groove function and Fourier series fitting Trough function of the method. This theoretical analysis method provides a good theoretical reference for clarifying the controversies in the process of grating replication, and improving the diffraction efficiency of UV gratings.