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用紫外 可见光透射光谱 (UV VIS)并结合键结构的X射线光电子能谱 (XPS)和红外谱 (FTIR)分析 ,研究了电子回旋共振等离子体增强化学气相沉积法制备的氟化非晶碳薄膜的光吸收和光学带隙性质 .在微波功率为 14 0—70 0W、源气体CHF3∶C6 H6 比例为 1∶1— 10∶1条件下沉积的薄膜 ,光学带隙在 1.76— 2 .85eV之间 .薄膜中氟的引入对吸收边和光学带隙产生较大的影响 ,吸收边随氟含量的提高而增大 ,光学带隙则主要取决于CF键的含量 ,是由于强电负性F的引入改变了价带带尾附近带隙中态密度的结果所至
The fluorinated amorphous carbon films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition method were studied by X-ray photoelectron spectroscopy (XPS) combined with infrared spectroscopy (FTIR) Of the optical absorption and optical band gap properties in the microwave power of 14 0-70 0W, the source gas CHF3: C6H6 ratio of 1: 1 to 10: 1 deposition conditions of the film, the optical band gap at 1.76-2.85eV Between the introduction of fluorine in the film on the absorption edge and the optical bandgap have a greater impact, the absorption edge increases with the fluorine content increases, the optical band gap mainly depends on the content of the CF bond is due to the strong negative charge F Introduced the result of changing the density of states in the band gap near the tail of the valence band