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介绍一种高温氧化薄膜应力的测定技术，它能在一定高温氧化条件下原位测定氧化膜中的生长应力，在某一温度变化范围内原位测定氧化膜中的热应力．这种技术可在普通衍射仪上进行
A method for measuring the stress of high temperature oxidation film is introduced. It can measure the growth stress of the oxide film in situ under certain high temperature oxidation conditions and determine the thermal stress in the oxide film in situ in a certain temperature range. This technique can be performed on a normal diffractometer