用简并四波混频技术 (DFWM)研究了nc Si∶H薄膜的三阶非线性光学性质 ,观察到了这种纳米薄膜材料的位相共轭信号 ,测得晶态比为XC1 =15 %和XC2 =30 % 的二个样品在光波波长为 5 89nm处的三阶非线性极化率分别为 χ1(3 ) =3 8× 10 - 6 esu和 χ2(3 ) =4 3× 10 - 7esu ,并对其光学非线性产生机理作了探讨 The third-order nonlinear optical properties of nc Si:H thin films were investigated by using the degenerate four-wave mixing technique (DFWM). The phase conjugation signals of the nanocrystalline films were observed. The crystalline ratio of XC1 = 15% and The third-order nonlinear polarizabilities of the two samples with XC2 = 30% at the wavelength of 5809nm are χ1 (3) = 38 × 10-6 esu and χ2 (3) = 4 3 × 10-7 esu respectively, The mechanism of its optical nonlinearity was also discussed