一、前言随着集成电路日趋向大规模、超大规模发展,对半导体工艺所需的掩膜也要求更微细化,因此,寻找制备简单、对热稳定、灵敏度高、分辨率好的抗蚀剂就成为半导体制造工艺不可缺少的组成部分了。为此,我们进行了甲基丙烯酸缩水甘油脂(GMA)和丙烯酸乙脂(EA)的共聚物—LS-9电子束胶的研制工作。通过研制证明:GMA和EA两种物质,以过氧 I. INTRODUCTION As integrated circuits are becoming more and more large-scale and ultra-large-scale development, the masks required for semiconductor processes are also required to be finer. Therefore, the search for simple, thermally stable, high-sensitivity and good-resolution resists It has become an indispensable part of the semiconductor manufacturing process. To this end, we conducted the research and development work on the copolymer LS-9 of GMA and EA. Through research and development to prove: GMA and EA two kinds of material, with peroxygen