采用红外椭圆偏振光谱仪对不同工艺条件下制备的CVD金刚石薄膜在红外波长范围内的光学参量进行了测量,分析了工艺条件对金刚石薄膜红外光学性质的影响.获得了最佳的沉积工艺参数,优化了薄膜的制备工艺.结果表明薄膜的折射率和消光系数与薄膜质量密切相关,当温度为750℃,碳源浓度为0·9%和压强为4·0kPa时,金刚石薄膜的红外椭偏光学性质最佳,折射率平均值为2·385,消光系数在10-4范围内,在红外波段具有良好的透过性. The optical parameters of CVD diamond films prepared under different process conditions in the infrared wavelength range were measured by infrared ellipsometer and the influence of process conditions on the infrared optical properties of the diamond films was analyzed.The optimum deposition process parameters were obtained and optimized The results show that the refractive index and extinction coefficient of the film are closely related to the film quality. When the temperature is 750 ℃, the carbon source concentration is 0.9% and the pressure is 4.0kPa, the infrared ellipsometry The best in nature, with an average refractive index of 2.385 and an extinction coefficient in the 10-4 range, with good transmission in the infrared band.