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痕量铜的极潜波研究近年来报导甚多,但用于高纯锌及锌电解液中痕量铜的直接测定,目前未见报导。本文在Cu-Oxine络合波研究的基础上,通过EDTA在pH8～9氨性介质掩蔽大量锌和采用二阶导数极谱技术,实现了大量锌存在下痕量铜的直接测定,经金属锌标样分析,结果令人满意。 本文拟定的测定条件为:8％EDTA—1％乙二胺—1×10~(-4)mol/LOxine,pH8～9,峰电位—0.56V(υs.SCE),检测下限1ng/g,铜的浓度在0.1～15.Oμg/25ml范围内与其峰电流呈线性关系,锌最大允许量
There have been a lot of reports on the trace amounts of trace copper in recent years. However, the direct determination of trace amounts of copper in high purity zinc and zinc electrolytes has not been reported yet. In this paper, based on the Cu-Oxine complex wave studies, a large amount of zinc was masked by EDTA in pH8 ~ 9 ammonia medium and the second-order derivative polarography was used to realize the direct determination of trace copper in the presence of a large amount of zinc. Standard analysis, the results are satisfactory. The assay conditions were as follows: 8% EDTA-1% ethylenediamine -1 × 10 -4 mol / LOxine, pH8-9, peak potential -0.56V (υs.SCE) The concentration of copper in the range of 0.1 ~ 15.Oμg / 25ml and its peak current was linear, the maximum allowable amount of zinc