A new improved two-step method in fabricating Tl2Ba2CaCu2O8 (T1-2212) thin films is presented in this paper.In the first process of dc magnetron sputtering,the thallium content in the precursor film is largely increased by adjusting the ratio of thallium in the sputtering targets.After the second annealing process in the absence of additional thallium pellets or powder source,high-quality T1-2212 thin films can be obtained.The proper content of thallium in the precursor film provides a relatively stable atmosphere to guarantee the growth of T1-2212 film.This method avoids the repeated production of the thallium pellets in the post-annealing process,the repeatability and controllability of the experiment are greatly improved.X-ray diffraction (XRD) scans show that all of the sharp peaks of the sample films can be assigned to the (001) peaks of T1-2212 phase.The highest superconducting critical temperature (Tc) of the films is 105 K and the critical current density (Jc) can achieve 1.93 MA/cm2 in zero magnetic field at 77 K for a 600 nm film.