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本文在陶瓷衬底上面利用磁控溅射的方法镀上一层厚金属钛,用不同方法对金属钛层进行表面处理,处理后的衬底放在微波等离子体化学气相沉积腔中,在相同的沉积条件下制备出不同微米金刚石薄膜。对不同的薄膜的微观表面形态、结构组成进行对比研究;对不同的薄膜用二极管型结构测试了它们的场致发射电子的性能,并对发射机理进行了深入的研究。最终分析出不同方法处理的衬底,对微米金刚石聚晶薄膜生长及场发射特性的影响的原因。
In this paper, a thick layer of titanium metal is deposited on the ceramic substrate by magnetron sputtering, and the titanium layer is surface-treated by different methods. The processed substrate is placed in a microwave plasma chemical vapor deposition chamber, Different deposition conditions of micron diamond films were prepared. The microscopic surface morphology and structure of different thin films were compared. The different films were tested for their field emission electron properties with diode-type structures and the emission mechanism was studied in depth. Finally, the reasons for the influence of substrates treated by different methods on the growth and field emission characteristics of polycrystalline diamond films are analyzed.