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使用直流磁控溅射装置,通过在溅射过程中加入不同的金属网格,300℃条件下在玻璃衬底上制备了不同晶粒尺寸的TiO2薄膜。利用X射线衍射谱(XRD)、场发射扫描电子显微镜(SEM)对薄膜的结构和表面形貌进行了分析,并使用紫外-可见分光光度计研究了TiO2薄膜的透射和吸收光谱。研究结果表明:金属网格在磁控溅射过程中能有效减小TiO2薄膜的晶粒尺寸,金属网格的网孔尺寸越小,晶粒尺寸越小,吸收边蓝移越明显。
Using a DC magnetron sputtering device, TiO2 films with different grain sizes were prepared on glass substrates at 300 ℃ by adding different metal grids during the sputtering process. The structure and surface morphology of the films were analyzed by X-ray diffraction (XRD) and field emission scanning electron microscopy (SEM). The transmission and absorption spectra of the films were studied by UV-visible spectrophotometer. The results show that the metal grid can effectively reduce the grain size of the TiO2 thin film during the magnetron sputtering process. The smaller the size of the metal grid is, the smaller the grain size is and the more the blue shift of the absorption edge is.