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利用正交试验法对活性屏快速离子渗氮工艺参数进行优化,并对正交试验预测的优化工艺参数进行了验证。利用Fick第二扩散定律对快速离子渗氮优化工艺的富氮层进行了氮浓度、氮浓度梯度的计算。试验及计算结果表明,高温渗氮温度、高温渗氮时间和低温渗氮时间对渗层厚度的影响较大,选择合适的参数可以在渗氮时间不变、渗层硬度不降低的前提下显著增加渗层厚度。当富氮层厚度为8μm时,采用快速渗氮技术得到试样内表面与基体之间的氮浓度梯度,为传统渗氮模式的20倍以上。
The orthogonal test method was used to optimize the parameters of the active ion fast nitriding process, and the optimum process parameters predicted by the orthogonal test were verified. The Fick second diffusion law was used to calculate the nitrogen concentration and nitrogen concentration gradient in the nitrogen-rich layer of the rapid ion nitriding optimization process. The results of experiments and calculations show that the effects of high temperature nitriding temperature, high temperature nitriding time and low temperature nitriding time on the thickness of the infiltration layer are large. Choosing suitable parameters can be significant under the condition of constant nitriding time and no decrease of hardness Increase the layer thickness. When the thickness of the nitrogen-rich layer is 8μm, the nitrogen concentration gradient between the inner surface of the sample and the substrate is obtained by the rapid nitriding technique, which is more than 20 times that of the conventional nitriding mode.