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采用扫描电化学显微镜(SECM),面扫描与线性扫描技术相结合,研究了HR-2不锈钢在0.5 mol/LH_2SO_4+0.1 mol/L NaCl溶液中的腐蚀行为。结果表明:HR-2不锈钢在该溶液中的开路电位、活化电位及钝化区电位分别为:-0.4V、-0.23V、0.0V～0.8V,基底保持开路电位和活化电位时,探头最大电流为9.5 nA和35.2 nA,基底形成钝化膜后探头电流明显减小;当探头电位为-0.2V时能有效氧化基底产生的H_2,0.6V时能有效氧化基底反应产生的Fe~(2+),探头-基底间距为20μm时,可较好地表征基底活性;当溶液中硫脲浓度为0.75 mmol/L时,有最佳的缓蚀作用。
The corrosion behavior of HR-2 stainless steel in 0.5 mol / LH 2 SO 4 + 0.1 mol / L NaCl solution was investigated by scanning electron microscopy (SECM), surface scanning and linear scanning. The results show that the open circuit potential, activation potential and passivation potential of HR-2 stainless steel in this solution are -0.4V, -0.23V and 0.0V ~ 0.8V, respectively. When the substrate maintains the open circuit potential and the activation potential, the maximum probe The current is 9.5 nA and 35.2 nA, the probe current decreases obviously when the substrate is formed passivation film; When the probe potential is -0.2V, it can effectively oxidize the H 2 produced by the substrate; when the voltage is 0.6V, it can effectively oxidize Fe 2 (2 +). When the probe-substrate spacing is 20μm, the activity of the substrate can be well characterized. When the concentration of thiourea in the solution is 0.75mmol / L, the best inhibition effect is achieved.