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Mo+C离子注入TiN薄膜后,在TiN薄膜注入层形成纳米纤维结构。纳米纤维丛排列整齐,结构完整,长度较长,均匀弥散在TiN晶体中。在距离表面深度为50~150 nm的区域,也能够产生TiN纳米纤维,但长度较短,排列基本规则。能谱分析显示,注入能量为80 keV的Mo离子注入TiN薄膜表面内的注入投影射程为50 nm左右,但离子注入的影响区域远大于投影射程;新生成的纳米纤维丛为富Mo相,Mo含量为17%~25%。Mo+C二元注入的表面强化效果优于Mo一元注入,较高剂量的Mo+C注入条件下,TiN薄膜表面显微硬度更高。
After the Mo + C ions are implanted into the TiN film, a nanofiber structure is formed on the TiN film injection layer. Nanofibers arranged in neat rows, the structure is complete, the length is longer, uniformly dispersed in the TiN crystal. TiN nanofibers can also be produced at a depth of 50-150 nm from the surface, but with shorter lengths and basic rules. The energy spectrum analysis shows that the implantation projection range of Mo ion implanted TiN film with energy of 80 keV is about 50 nm, but the influence area of ion implantation is much larger than the projection range. The newly formed nanofibers are Mo-rich and Mo The content is 17% ~ 25%. The surface strengthening effect of Mo + C binary injection is better than that of Mo one-element injection, and the microhardness of TiN film is higher under higher dose of Mo + C implantation.