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本文讨论了光刻工艺中Si_3N_4膜的几种化学腐蚀的工艺、原理及影响化学腐蚀的一些因素,并对干法化学腐蚀与湿法化学腐蚀进行了较为详细的比较。
This article discusses several chemical etching of Si_3N_4 film in photolithography process of chemical etching, the principle and some factors that affect chemical corrosion, and dry chemical and wet chemical corrosion were compared in more detail.