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利用原子力显微镜(AFM)接触模式机械刻蚀的方法,在双层金属Pt/Cu电极表面进行纳米结构的构筑,通过分析不同加工参数(针尖上施加的载荷大小,扫描速度,循环次数)对加工结构尺寸的影响,能得到结构尺寸任意控制的纳米图案.通过在空气中自然氧化和选择合适的参数,得到了铂-氧化铜-铂的纳米结构.用导电模式AFM和摩擦力图像对该结构进行了原位检验,发现在加工区域内出现了明显的半导体特征,对应的摩擦力图像同样直观显示出这种结构是由两种不同材料构成.结果表明采用这种特殊的AFM刻蚀方式,可作为加工新型金属氧化物半导体纳米电子器件的重要手段.
The structure of nanostructures was fabricated on the surface of double-layer Pt / Cu electrode by means of mechanical etching with atomic force microscope (AFM) contact mode. Through the analysis of different processing parameters (load applied on tip, scanning speed and number of cycles) Structure size of the nano-pattern can be arbitrarily controlled by the structure size obtained by natural oxidation in the air and select the appropriate parameters of the platinum-copper oxide-platinum nanostructures obtained with conductive mode AFM and friction images of the structure In situ testing showed that obvious semiconducting features appeared in the processing area and the corresponding frictional images also showed that the structure was composed of two different materials.The results showed that using this special AFM etching method, Can be used as an important means of processing new type of metal oxide semiconductor nanoelectronic devices.