【摘 要】
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Nano-graphite films have been deposited on n-Si substrates by microwave plasma chemical vapour deposition. The surface morphology and microstructure of the film
【机 构】
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Laboratory of Materials Physics (Ministry of Education) and Department of Physics, Zhengzhou Univers
论文部分内容阅读
Nano-graphite films have been deposited on n-Si substrates by microwave plasma chemical vapour deposition. The surface morphology and microstructure of the films were tested by scanning electron microscopy, x-ray diffraction and Raman spectroscopy. In the field emission measurement, a tu-on field of 0. 5 V/μm and a high emission-site density of 105/cm2 on a tested emission area of (34 × 35 mm2) have been obtained.
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