New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indicated that the hybrid photopolymer exhibits advantages of both the acrylate-based photosensitive resin and the epoxy-based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage. Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLA-I from this hybrid resin successfully and efficiently. New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indicated that the hybrid photopolymer development advantages of both the acrylate-based photosensitive resin and the epoxy-based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage. Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLA-I from this hybrid resin successfully and efficiently.