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采用磁控溅射物理气相沉积(PVD)法在SiC纤维表面进行Ti3Al涂层的制备,研究了该过程中PVD溅射电流对Ti3Al涂层组织结构的影响规律。通过X射线衍射(XRD)、扫描电子显微镜(SEM)和原子力显微镜(AFM)对Ti3Al涂层的沉积率、组成物相、晶粒大小、组织结构和表面形貌等进行了观察与分析。研究结果表明,磁控溅射PVD法制得的Ti3Al涂层组成物相与靶材一致,但涂层生长择优取向发生了变化。随着溅射电流的增大,Ti3Al涂层沉积率提高,平均晶粒尺寸增大。此外,涂层的微观形貌为柱状晶组织,但随着溅射电流的增加,涂层表面因粒子溅射辐照温度的升高而升温,同时晶粒边界出现迁移,涂层生长由V型柱状晶生长向等轴柱状晶生长转变,最后形成致密组织。涂层粗糙度的变化与涂层晶粒尺寸和微观结构有关,因此Ti3Al涂层表面粗糙度随着溅射电流增加呈现出先增大后减小的规律。
The Ti3Al coating was prepared on the surface of SiC fiber by magnetron sputtering physical vapor deposition (PVD) method. The influence of PVD sputtering current on the microstructure of Ti3Al coating was studied. The deposition rate, compositional phase, grain size, microstructure and surface morphology of Ti3Al coating were observed and analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) The results show that the composition of Ti3Al coating prepared by magnetron sputtering PVD method is consistent with the target, but the preferred orientation of coating growth changes. With the increase of sputtering current, the deposition rate of Ti3Al coating increases and the average grain size increases. In addition, the microstructure of the coating is columnar grain structure, but with the increase of sputtering current, the surface of the coating is heated due to the increase of the irradiation temperature of particle sputtering, and the grain boundary appears migration. The coating growth is V Type columnar crystal growth to the equiaxed columnar crystal growth transformation, and finally the formation of dense tissue. The change of coating roughness is related to the grain size and microstructure of the coating. Therefore, the surface roughness of Ti3Al coating increases first and then decreases with the increase of sputtering current.