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本文介绍电子束投影复印曝光机的结构和性能。此复印曝光机的特点是采用电子束能够同时曝光大面积的图形,复印图形的面积为φ50毫米,最高分辨率为0.5微米。此复印曝光机可在半导体技术中用于复制高分辨率的掩模版和制作声表面波器件,光栅器件等。
This article describes the structure and performance of electron beam projection copy exposure machine. This copy exposure machine is characterized by the use of electron beams to simultaneously expose a large area of the graphics, copy graphics area of φ50 mm, the highest resolution of 0.5 microns. This copy exposure machine can be used in semiconductor technology for the replication of high resolution reticle and the production of surface acoustic wave devices, grating devices.