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5. The even device fabricated by the deep etched binary optics technology for the exposure system of th

The even device fabricated by the deep etched binary optics technology for the exposure system of th

来源 :中国科学：技术科学英文版 | 被引量 : 0次 | 上传用户：wenmin673594913

【摘 要】

：

［1］Xu Ping, Tang Jiyue, Guo Lurong et al., Deep etch element of binary optics, Acta Optica Sinica, 1996, 16(12): 1796-1801.［2］Xu Ping, Tang Jiyue, Guo Lurong et al.

【作 者】

：

Ping Xu (1)  Yiling Sun (1) 

【机 构】

：

1.PhotoelectronTechnology&,EngineeringDepartmentofScience&,TechnologyInsitute

【出 处】

：

中国科学：技术科学英文版

【发表日期】

：

2002年1期

【关键词】

：

深蚀刻的二进制光学 元素 甚至设备 错误分析 deep etched binary optics element even device error analy 

【基金项目】

：

This work was supported by the National Natural Science Founation of China and the Science and Technology Fund of Shenzhen.

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论文部分内容阅读

［1］Xu Ping, Tang Jiyue, Guo Lurong et al., Deep etch element of binary optics, Acta Optica Sinica, 1996, 16(12): 1796-1801.［2］Xu Ping, Tang Jiyue, Guo Lurong et al., Fabrication error simulation of deep etched binary optics, Chinese Journal of Laser, 1997

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