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以Karstedt催化剂,催化端氢硅油(DHPS)和三缩丙二醇二丙烯酸酯(TPGDA)的硅氢加成反应,合成光敏性有机硅丙烯酸酯(SA)。反应产物用红外光谱和紫外-可见光谱进行了表征,将不同比例的有机硅丙烯酸酯作为活性稀释剂添加到光固化体系中,考察了配方分别在空气和N2中的光固化性能,利用扫描电镜观察了光固化膜的表面形貌,研究了SA对光固化材料机械性能、热稳定性以及化学稳定性的影响。结果表明,氧阻聚作用对于SA配方比较明显,能显著降低其固化速率;SA对光固化膜物理化学性能有一定影响,含有5%SA的光固化材料综合性能优异,超过此含量,光固化材料机械和化学稳定性随着SA含量的增加反而降低;热重分析表明,SA能提高体系的热稳定性。
Photosensitive silicone acrylates (SA) were synthesized by the hydrosilylation reaction of Karstedt catalyst, end-hydrogenated silicone oil (DHPS) and tripropylene glycol diacrylate (TPGDA). The reaction products were characterized by FT-IR and UV-Vis spectra. Different proportions of silicone acrylate as reactive diluents were added into the photo-curing system. The photocuring properties of the formulations in air and N2 were investigated. Scanning electron microscopy The surface morphology of photocured films was observed and the effects of SA on the mechanical properties, thermal stability and chemical stability of photocured materials were investigated. The results show that the oxygen inhibition effect is obvious for the SA formulation, which can significantly reduce the curing rate; SA has some impact on the physical and chemical properties of the light cured film, the light curing material containing 5% SA excellent overall performance, beyond this content, The mechanical and chemical stability of the materials decreased with the increase of SA content. Thermogravimetric analysis showed that SA could improve the thermal stability of the system.