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针对4.48nm类镍钽软X射线激光及其应用实验,设计制备了工作于这一波长的近正入射多层膜高反射镜。选择Cr/C为制备4.48nm高反射多层膜的材料对,通过优化设计,确定了多层膜的周期、周期数以及两种材料的厚度比。模拟了多层膜非理想界面对高反射多层膜性能的影响。采用直流磁控溅射方法在超光滑硅基片上实现了200周期Cr/C多层膜高反射镜的制备。利用X射线衍射仪测量了多层膜结构,在德国BessyⅡ同步辐射上测量了在工作波长处多层膜反射率,测量的峰值反射率达7.5%。对衍射仪测量的掠入射反射曲线和同步辐射测量的反射率曲线分别进行拟合,得到的粗糙度和厚度比的结果相近。测试结果表明,所制备的Cr/C多层膜样品结构良好,在指定工作波长处有较高的反射峰,达到了设计要求。
For 4.48nm nickel-tantalum soft X-ray laser and its application experiments, a near-normal incidence multi-film high-reflection mirror operating at this wavelength is designed and fabricated. Select Cr / C to prepare 4.48nm high reflective multilayer material pairs, through the optimal design, to determine the multilayer film cycle, the number of cycles and the thickness ratio of the two materials. The effect of multi-layer non-ideal interface on the performance of highly reflective multilayer films is simulated. The preparation of a 200 cycle Cr / C multilayered high-reflection mirror was achieved by DC magnetron sputtering on an ultra-smooth silicon substrate. The multilayers were measured by X-ray diffractometer. The multilayer reflectivity at the working wavelength was measured on German Bessy II synchrotron radiation. The measured peak reflectivity was 7.5%. The grazing incidence reflectance curve measured by the diffractometer and the reflectance curve measured by synchrotron radiation were respectively fitted, and the obtained results of roughness and thickness ratio are similar. The test results show that the prepared Cr / C multilayer samples have good structure and high reflection peak at the specified working wavelength, meeting the design requirements.