采用原位Ｘ射线衍射法定量地分析研究了多晶Ｎｉ／非晶Ｓｉ成分调制膜中的固相反应非晶化过程．提出了非晶ＮｉＳｉ相在Ｎｉ／ａＳｉ多层膜固相非晶化反应中的生长模型．并对Ｎｉ晶界上的非晶化现象给予热力学和动力学上的解释． In situ X - ray diffraction method was used to quantitatively study the solid state reaction amorphization in polycrystalline Ni / amorphous Si films. The growth model of amorphous NiSi phase in Ni / aSi multilayers solidphase amorphization was proposed. The thermodynamics and kinetics of the amorphization on the Ni grain boundaries are also given.