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本文采用射频反应磁控溅射法溅射ZnO靶,直流磁控溅射法溅射Cu靶,在玻璃衬底上制备了不同复合结构的Cu、ZnO透明导电薄膜,研究了Cu层溅射时间对薄膜结构形貌和光电性能的影响。结果表明Cu夹层对膜系的导电性起主要作用,电阻率先随沉积Cu层溅射时间的增加而显著降低,后变化趋于平缓。样品可见光范围内透射率随Cu层溅射时间增加而降低。并且比较相同条件下制备的两种薄膜后得出,ZnO/Cu薄膜电阻率相对较低,ZnO/Cu/ZnO薄膜透射率相对略高。
In this paper, RF reactive magnetron sputtering sputtering ZnO target, DC magnetron sputtering sputtering Cu target, prepared on the glass substrate with different composite structure of Cu, ZnO transparent conductive film, the Cu layer sputtering time Effect on Structure and Photoelectric Properties of Film. The results show that Cu interlayers play a major role in the conductivity of the films. The resistivity decreases first with the deposition time of the deposited Cu layer and then changes slowly. The transmittance in the visible range of the sample decreases with the sputtering time of Cu layer increasing. And comparing the two films prepared under the same conditions, the resistivity of ZnO / Cu film is relatively low and the transmittance of ZnO / Cu / ZnO film is relatively high.