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离子注入是通过高速离子束将某种化学元素移植到固体表面层的一种新技术。离子注入最早应用于半导体领域,近年来又用来改善合金的耐磨性、抗腐蚀性和提高疲劳寿命。 众所周知,疲劳是材料失效破环的主要方式之一。由于材料的早期疲劳裂纹萌生,通常与其表面性质如表层滑移带的形成和发展、相邻晶粒变形的相容性等密切相关。因此离子注入对材料疲劳性能的影响已成为令人关注的课题。目前这方面的工作还处于起始阶段,报道不多,而且结果很分散甚至相互矛盾。
Ion implantation is a new technique for transplanting a chemical element into a solid surface layer by a high-speed ion beam. Ion implantation was first applied to the field of semiconductors, in recent years has been used to improve the wear resistance of alloys, corrosion resistance and improve fatigue life. As we all know, fatigue is one of the main ways of material failure. Due to the early fatigue crack initiation, the surface properties are usually closely related to the formation and development of surface slip bands and the compatibility of adjacent grain deformation. Therefore, ion implantation on the fatigue properties of materials has become an issue of concern. At present, the work in this area is still in the initial stage with few reports and the results are very scattered and even contradictory.