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利用直流磁控反应溅射法在 Al基底上制备了 Zr N2 及 Ti多层薄膜。利用扫描俄歇微探针的深度剖析和线形分析技术研究了真空热处理对 Ti/ Zr N2 / Al样品膜层之间的界面化学状态和相互作用的影响。研究结果表明 ,真空热处理使 Ti/ Zr N2 / Al薄膜界面上发生了明显的界面扩散和化学反应 ,生成了 Ti Nx 物种 ,并且薄膜内层发生了严重的氧化反应
Zr N2 and Ti multilayer films were prepared on Al substrate by DC magnetron reactive sputtering. The effect of vacuum heat treatment on the interface chemical state and interaction between the Ti / Zr N2 / Al samples was studied by the depth analysis and linear analysis of Auger microprobe. The results show that vacuum heat treatment causes obvious interfacial diffusion and chemical reaction at the interface of Ti / Zr N2 / Al thin film, TiNx species are formed, and serious oxidation reaction occurs in the inner layer