论文部分内容阅读
采用金属有机化学气相沉积方法,在Si(100)衬底上生长出具有高度C轴择优取向的ZnO薄膜.通过X射线衍射、原子力显微镜和室温光致发光谱研究了厚度对ZnO薄膜的结构、表面和光学性能的影响.X射线衍射图显示ZnO薄膜只有单一的(0002)峰,具有高度择优取向.AFM和PL测试表明,在取样薄膜厚度范围内,薄膜的表面质量和发光性能没有随着薄膜厚度的增加而提高.这是因为薄膜在厚度增加的生长过程中,生长模型变化且晶粒增大.
ZnO films with high C-axis preferred orientation were grown on Si (100) substrates by metal-organic chemical vapor deposition method.The structures of ZnO thin films were studied by X-ray diffraction, atomic force microscopy and room temperature photoluminescence spectra, Surface and optical properties.X-ray diffraction patterns show that there is only a single (0002) peak in the ZnO thin films with a high degree of preferred orientation.The AFM and PL tests show that the surface quality and luminescence properties of the films do not vary with the film thickness The increase of the film thickness is due to the change of the growth model and the increase of the crystal grains during the growth of the film with increasing thickness.