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(1)概述为研究离子电流密度对氧化膜层的影响,印度海德拉巴市O sm ania大学化学系的学者研究了室温下电流密度从2m A·cm-2～14m A·cm-2的Zr-4合金和N b的阳极氧化动力学曲线。该试验通过电容数据测算阳极膜厚度。实验表明,Zr-4合金和N b阳极氧化膜的形成速率、电流效率和电场
(1) Overview In order to study the effect of ionic current density on the oxide film, scholars at the Department of Chemistry at O smia University in Hyderabad, India, studied the effect of Zr on current density from 2 m A · cm -2 to 14 m A · cm -2 at room temperature -4 alloy and N b anodic oxidation kinetics curve. The test measures the anode film thickness from the capacitance data. Experiments show that the Zr-4 alloy and N b anodized film formation rate, current efficiency and electric field