最近英国马拉德公司研究实验室研究出一种改进集成电路电阻的线性和薄阻的方法。从前要制作精小、高值、线性电阻在一块适用的集成电路上的硅单片是有困难的,电阻不是用摸拟制作,就是用复杂工艺如外延层淀积,但有缺点易产生非线性电阻。 Recently, the British Mallard Research Laboratory has developed a method to improve the resistance of the integrated circuit linear and thin resistance. Once upon a time, it was difficult to fabricate a silicon monolithic piece of small, high value, linear resistance on a suitable integrated circuit. The resistance was either produced by a simulation or by a complex process such as epitaxial layer deposition, Linear resistance.