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已研制成一种新的高分辨率光刻版,它使微电子工业能够容易而又简单地生产完整性极高的掩模。GAF微线高分辨率透明版HR-320是涂敷了一薄层正性无粒透明光敏材料的极平滑的玻璃片。用普通的设备曝光,但是用一种简单的气相技术-底版不触及任何液体,在1～2分钟内就能完成版的复印。微电子电路生产中光刻工艺的关键项目是高分辨率掩模。从微电子工业的初期起,就常用微粒卤化银明胶高分辨率玻璃版制备掩模。它的限制是众所周知的。即由于乳胶本身颗粒
A new high-resolution lithographic plate has been developed that enables the microelectronics industry to produce extremely complete masks easily and simply. The GAF Microwire High Resolution Clear Plate HR-320 is a very smooth glass sheet coated with a thin layer of positive, non-clear, transparent photo-sensitive material. With ordinary equipment exposure, but with a simple gas phase technology - the bottom plate does not touch any liquid, in 1 to 2 minutes to complete the version of the copy. The key project for lithography in the fabrication of microelectronic circuits is high resolution masks. From the very beginning of the microelectronics industry, a mask was prepared using a high resolution glass plate of particulate silver halide gelatin. Its limitations are well known. That is due to the latex itself particles