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本文从投影光刻工艺的特殊要求出发,简要分析了在投影分步重复光刻机上配用自动调焦及调平系统的重要意义,着重介绍了两个光电式自动调焦、调平系统的原理、实验结果及主要特点。原理性实验结果表明,用两系统检测各种光刻过的晶片,都能得到小于0.2微米的离焦量和小于10秒(0.5微米/10毫米)的楔度的灵敏度,这能满足各种精细投影复印机的要求。
Based on the special requirements of the projection lithography process, this paper briefly analyzes the significance of using automatic focusing and leveling system on a projection step-by-step lithography machine, and emphatically introduces two photoelectric automatic focusing and leveling systems Principle, experimental results and main features. The experimental results show that using two systems to inspect a variety of lithographically-etched wafers results in less than 0.2 micron defocus and less than 10 second (0.5 micron / 10 mm) wedge sensitivity for a wide variety of Fine projection copier requirements.