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用苯作工作气体 ,在一个电子回旋共振 (ECR)微波等离子体化学气相沉积系统中制备了含氢非晶碳膜 (a -C :H) .对苯等离子体作了质谱分析 ,发现苯分解后形成的主要基团是C2 H4等 ,而不是常规甲烷放电的CH3,这将影响膜的结构。实验中还考察了沉积参数 ,如功率、气压、流量、基片温度对膜的沉积速率的影响。实验表明 :沉积速率随微波功率、气压和流量的增加而上升 ;随温度的升高先升后降 ,存在极值。对制备的膜作了氢含量和Raman谱分析 ,结果显示随着基片温度的增加 ,sp3结构在膜中所占的比例增大 ,膜更趋向于类金刚石膜。
Hydrogen-containing amorphous carbon films (a -C: H) were prepared in an electron cyclotron resonance (ECR) microwave plasma chemical vapor deposition system using benzene as the working gas. The benzene plasma was analyzed by mass spectrometry, After the formation of the main group is C2 H4, etc., rather than conventional methane discharge CH3, which will affect the membrane structure. The experiment also investigated the deposition parameters, such as power, pressure, flow rate, substrate temperature on the deposition rate of the film. The experimental results show that the deposition rate increases with the increase of microwave power, pressure and flow rate. With the increase of temperature, the deposition rate increases first and then decreases, and the extreme value exists. Hydrogen content and Raman spectrum analysis of the prepared films showed that with the increase of the substrate temperature, the proportion of sp3 structure in the films increased, and the films tended to be diamond-like films.