论文部分内容阅读
由上海第二光学仪器厂试制的 FB-1型精密接触式翻版机已通过鉴定。用于半导体集成电路光刻掩模版的复制。该机达到了设计要求,性能稳定可靠,对国内外各种超微粒干版和光刻胶有广泛的适应性。可复制各种规格的铬版、超微粒干版。在分辨率、光源照度均匀性以及操作程序控制方面的拔术指标达到日本 DS-P-210型接触式翻版机的水平,能满足国内大
The FB-1 type precision touch plate duplicator trial-produced by Shanghai No.2 Optical Instrument Factory has passed the appraisal. For the replication of semiconductor integrated circuit lithography reticle. The aircraft has reached the design requirements, stable and reliable performance, a variety of domestic and foreign super-fine particles and photoresist has a wide range of adaptability. Can copy a variety of chrome version, super-particle dry version. In terms of resolution, uniformity of light illumination and control of the operating procedures of the pull indicators to reach the level of Japan DS-P-210 contact type pigeonhole machine to meet the domestic large