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针对脉冲激光沉积(PLD)薄膜装置,建立了时间分辨等离子体发射光谱测量系统,在沉积类金刚石(DLC)薄膜时,通过对CII(426.7 nm)和CIII(229.7 nm)的发射谱测量发现,当脉冲激光轰击石墨靶材时,C发射谱强度均随时间变化,表现为由强变弱的时间变化过程,并且与靶材的表面状况有很强的相关性。实验过程中保持激光的脉冲频率和单脉冲能量不变,在石墨靶固定时,碳发射谱强度随时间呈快速下降趋势,当石墨靶旋转时,碳发射谱强度变化较为缓慢。实验发现,CIII和CII的发射谱强度的比值随时间逐渐增大。
Aiming at the pulse laser deposition (PLD) thin film device, a time-resolved plasma emission spectrometry system was established. By measuring the emission spectra of CII (426.7 nm) and CIII (229.7 nm) during the deposition of DLC films, When pulsed laser bombarding graphite target, the intensity of C emission spectrum changes with time, showing strong and weak changes in time, and has a strong correlation with the surface conditions of the target. During the experiment, the laser pulse frequency and single pulse energy are kept constant. When the graphite target is fixed, the intensity of the carbon emission spectrum decreases rapidly with time. When the graphite target is rotated, the carbon emission intensity changes slowly. It was found experimentally that the ratio of emission spectral intensities of CIII and CII increased with time.