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采用溶胶凝胶协同自组装与光刻相结合的方法,在光子晶体反蛋白石结构中引入缺陷,通过溶胶凝胶协同自组装方法在硅片上垂直沉积胶体晶体复合薄膜,把BP212正性光刻胶均匀旋涂在复合薄膜上,通过曝光、显影等光刻工艺,把掩膜版图案复制在复合薄膜上,用此样品再次垂直沉积一层复合薄膜,使图案被复合薄膜覆盖.最后去除胶体微球与光刻胶图案,从而在反蛋白石结构中引入缺陷,用扫描电子显微镜对样品进行表征.分析了光刻胶图案对胶体微球排列的影响.
The sol-gel synergistic self-assembly and photolithography were used to introduce defects into photonic crystal anti-opal structure. Colloidal crystal composite films were deposited on the silicon wafer by sol-gel synergistic self-assembly method. The BP212 positive photolithography Glue evenly spin-coated on the composite film, by exposure, development and other photolithographic process, the mask version of the pattern is copied on the composite film, with this sample again vertically deposited a layer of composite film, the pattern is covered by the composite film Finally, remove the gel Microspheres and photoresist patterns to introduce defects into the inverse opal structure, and the samples were characterized by scanning electron microscopy.The influence of the photoresist pattern on the arrangement of colloidal microspheres was analyzed.