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光致抗蚀感光干膜习惯称“光致抗蚀干膜”,简称“干膜”。它是由三层物质构成,即由聚酯膜层(厚35微米左右)和聚乙烯膜层(厚30微米以上),中间夹光敏感光剂层组成的一种感光薄膜。这种干膜耐一定的电镀溶液、化学溶液的浸蚀,其失效期在半年以上,并便于运输,分辨率较高(可制出0.1毫米以下的精细图文)。所以在印制电路板的制造中得到广泛的应用。我国目前已有生产。
Photoresist photosensitive dry film used to call “dry photoresist film”, referred to as “dry film.” It consists of three layers of material, that is, a polyester film layer (about 35 microns thick) and polyethylene film layer (30 microns thick), the middle layer of photosensitive photosensitive agent composition of a light-sensitive film. This dry film resistant to a certain plating solution, chemical solution erosion, the expiration of more than six months, and easy to transport, high resolution (can produce fine graphics below 0.1 mm). Therefore, in the manufacture of printed circuit boards are widely used. At present, China has production.