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随着电子工业,特别是半导体集成电路的发展,不断地、越来越广泛地要求光学工业为它服务,而且对仪器的精度以及各项技术性能指标的要求也日益提高。这些仪器包括图形初缩、精缩制版,图形发生器,接触式、接近式和投影式光刻机以及测试掩模版或集成电路的各种光学仪器。上述仪器已形成光学仪器中的一个新分支。
With the development of the electronics industry, especially the semiconductor integrated circuits, the optical industry constantly and more and more needs to be served by it, and the requirements on the accuracy of the instruments and various technical performance indexes are also increasing. These instruments include a variety of optical instruments such as graph blanks, platesetters, pattern generators, contact, proximity and projection lithography machines as well as test reticles or integrated circuits. The above instrument has formed a new branch in optical instruments.