To increase the low-field magnetostriction of TbFe films, the influences of sputtering angles and annealing temperatures on its magnetic and magnetostrictive performances were systematically investigated. With the change in detection of magnetic domains by MFM (magnetic force microscopy) indicates that the easy magnetization direction shifts gradually from perpendicular to parallel to the film plane with decreasing sputtering angles. Annealing can enhance the magnetization and magnetostriction of the TbFe films. However, at too high annealing temperature,both the magnetization and magnetostriction of the TbFe films were suppressed to some extent.