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利用等离子体增强磁控溅射离子镀（ＰＥＭＳＩＰ），先在铁基体上镀一层很薄的钛中间层，继之沉积ＴｉＮ。对膜层进行俄歇电子能谱（ＡＥＳ）分析和透射电镜（ＴＥＭ）分析。结果表明，膜与基体之间有厚约５０ｎｍ的过渡层；膜基界面处有ＦｅＴｉ相；中间层与后继膜交接处Ｔｉ２Ｎ与α－Ｔｉ有取向关系。
Using plasma-enhanced magnetron sputter ion plating (PEMSIP), a thin layer of titanium intermediate is deposited on the iron substrate followed by the deposition of TiN. The coatings were analyzed by Auger electron spectroscopy (AES) and transmission electron microscopy (TEM). The results show that there is a transition layer with a thickness of about 50 nm between the film and the substrate, FeTi phase at the film-base interface, and Ti2N and α-Ti at the interface between the interlayer and the subsequent film.