论文部分内容阅读
一引言低温等离子体化学是当前研究和应用开发十分活跃的一个领域。在金属及半导体表面刻蚀,金属及高分子材料的表面改性,各种薄膜及新材料的制备等方面都得到广泛应用。但由于对等离子体本身各种物理量的测定和表征工作注意不够,往往停留在一些宏观参数,如电压、电流、气压等的描述。所以当试验条件不同时,得到的结果差异很大,使实验结果的解析和同种文献间的比较十分困难。
I. INTRODUCTION Low temperature plasma chemistry is an area where current research and application development are very active. In the metal and semiconductor surface etching, metal and polymer surface modification, a variety of films and the preparation of new materials have been widely used. However, due to insufficient attention to the measurement and characterization of various physical quantities of the plasma itself, it often stays in the description of some macro parameters such as voltage, current and pressure. Therefore, when the test conditions are different, the results obtained vary greatly, so that the analysis of experimental results and comparison of the same kind of documents is very difficult.