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本文主要论述基板员偏压与铜基体磁控溅射离子镀铝膜的关系。磁控溅射离子镀 铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。膜的相组成主要是由基板 负偏压所决定的。在一定的实验条件下，每一种铜－铝合金相的出现都有一临界负偏压 与之对应．
This article mainly discusses the substrate member bias and copper matrix magnetron sputtering aluminum film. Magnetron sputtering ion plating aluminum film is not a simple external aluminum film, but the composition of copper and aluminum alloy film. The phase composition of the membrane is mainly determined by the substrate negative bias. Under certain experimental conditions, the occurrence of each copper-aluminum alloy phase corresponds to a critical negative bias voltage.